PICOSUN PROVIDES THE LEADING ATOMIC LAYER DEPOSITION (ALD) THIN FILM COATING SOLUTIONS FOR GLOBAL INDUSTRIES
Picosun offers production-proven ALD solutions for semiconductor, IC, LED, MEMS, and sensor industries with world-leading process uniformity and purity, highest uptime and yield, and low cost-of-ownership.
Picosun's ALD technology enables also anti-tarnishing, decorative, and protective coatings on mechanical items such as coins, watch and jewelry parts, biocompatible coatings for medical devices, and gas- and moisture-tight encapsulation films for e.g. OLEDs and printed electronics.
WHAT IS ALD?
Atomic Layer Deposition (ALD) is the most advanced, highly sophisticated thin film vacuum coating method by which ultra-thin layers of various materials can be manufactured on almost all kinds of surfaces.Learn more
ALD has several benefits over other thin film coating technologies such as chemical or physical vapor deposition (CVD/PVD) or sputtering.
Ald thin film coating applications
Picosun ALD products
PICOSUNTM P-series batch ALD systems define a new era of high volume ALD production up to 450 mm wafer size. The P-series tools are also ideal for large batches of 3D items, powders, and HAR samples. Our fully automated, vacuum cluster and production line compatible P-series ALD reactors ensure maximum yields and cost-efficient throughput with world-leading process purity and film uniformity, fulfilling even the strictest quality requirements of today's semiconductor industries.
PICOSUNTM R-series ALD tools are optimized for research, product development, and pilot production. The versatile reactor design enables deposition on up to 200 mm wafers, 3D objects, and porous, powderous, and HAR substrates. The unique scalability of the PICOSUNTM R-series tools enables smooth transition of the research results into production with PICOSUNTM P-series ALD systems.